Neutrogena Clear & Defend Moisturiser 50 ml kosteusvoide
Helps fade the marks left by pimples, while maintaining the skin's natural balance. Moisturizes for 24 hours without clogging pores.
Price
Price of the product when purchased separately:
6,99 €
(139,80 / liter)
Shipping costs starting from
3,90€
Neutrogena® Clear & Defend Moisturizer containing cleansing salicylic acid for acne-prone skin.
Ingredients: Aqua, Glycerin, Propylene Glycol, Cetyl Alcohol, C12-15 Alkyl
Benzoate, Glyceryl Stearate, PEG-100 Stearate, Stearyl Alcohol, C12-15 Alkyl Lactate, Dicaprylyl Ether, Aloe Barbadensis Leaf Extract, Chamomilla Recutita Extract, Cocamidopropyl PG-DimoniumChloride Phosphate, Salicylic Acid, Menthyl Lactate, Cetyl Lactate, Dimethicone, Propylene Glycol Isostearate, Sodium Isostearoyl Lactylate, Palmitic Acid, Stearic Acid, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Carbomer, Sodium Chloride, Disodium EDTA, Sodium Hydroxide, Benzalkonium Chloride, Phenoxyethanol, Ethylparaben, Methylparaben, Propylparaben, Parfum, Benzyl Alcohol [PR- 0001035
- Oil-free moisturizer moisturizes for 24 hours without clogging skin pores
- Clinically proven to prevent impurities
- The formula containing aloe vera and chamomile helps fade the marks left by pimples, while maintaining the skin's natural balance.
Ingredients: Aqua, Glycerin, Propylene Glycol, Cetyl Alcohol, C12-15 Alkyl
Benzoate, Glyceryl Stearate, PEG-100 Stearate, Stearyl Alcohol, C12-15 Alkyl Lactate, Dicaprylyl Ether, Aloe Barbadensis Leaf Extract, Chamomilla Recutita Extract, Cocamidopropyl PG-DimoniumChloride Phosphate, Salicylic Acid, Menthyl Lactate, Cetyl Lactate, Dimethicone, Propylene Glycol Isostearate, Sodium Isostearoyl Lactylate, Palmitic Acid, Stearic Acid, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Carbomer, Sodium Chloride, Disodium EDTA, Sodium Hydroxide, Benzalkonium Chloride, Phenoxyethanol, Ethylparaben, Methylparaben, Propylparaben, Parfum, Benzyl Alcohol [PR- 0001035
- EAN: 3574661332581
- SKU: 102522314
- Vendor material number: 2168870
Payment Methods:
